Abracon LLC.

<p>I suspect that customers' attitudes about offshoring influence their perceptions of agents' competence. Some customers may object so much to offshoring in principle that, in their minds, any agent with an accent becomes an inadvertent symbol of cheap, overseas labor that preys on American jobs.</p>

TDK Innoveta(847) 498-0099www.tdkinnoveta.com

In the first nine months of 2004, UMC's sales were NT$89.08 billion (about $2.64 billion) up 45.7 percent compared with the same period in 2003, the company said.

As is normal for UMC, the company provided no commentary on its sales figures.

CW02B681R0KE12_Datasheet PDF

SAN JOSE, Calif. — KLA-Tencor Corp. is working with IMEC, a nanoelectronics research center based in Belgium, to try and enable the use of optical critical dimension (CD) metrology for semiconductor applications at 65-nanometers and below, KLA, a maker of optical CD metrology equipment, said Thursday (Oct. 7).

Optical CD metrology is already used to control shallow trench isolation (STI) and gate deposition within 90-nanometer manufacturing processes but needs to be extended to work at sub-65-nm manufacturing nodes, KLA said. The partners also expect to expand the use of the technique into such applications as 3-D contacts and via layers.

KLA-Tencor and IMEC are to use a SpectraCD 100 optical CD metrology tool for these development efforts.

CW02B681R0KE12_Datasheet PDF

Maintaining control over the lithography process continues to remain one of the most pressing challenges that chipmakers face as they drive deeper into the Nano Realm,” said Luc Van den hove, vice president of IMEC, in a statement issued by KLA-Tencor. Optical CD metrology has demonstrated its viability in 90-nm production for controlling critical patterning steps, and we are continuing our very effective partnership with KLA-Tencor to further develop this technology due to the company's aggressive investment in this technology. We believe that by working together, we can speed the implementation of optical CD metrology as a mainstream solution for managing lithography yields at the 65-nm node and beyond,” he also said.

The transition to 65-nm and smaller design rules creates a new set of challenges for lithography process control, KLA-Tencor said. Ultra-high numerical aperture (NA) lithography tools and immersion lithography, both of which are expected to be introduced in production at the 65-nm node and below, will further reduce the size of lithography process windows-accelerating the need for tighter lithography control in production, the company added.

CW02B681R0KE12_Datasheet PDF

Renesas Technology has announced the H8/38602F , the first of its new Tiny Super Low Power microcontrollers. The device uses a high performance 16-bit H8/300H CPU core that offers extremely low power consumption and includes 16 kbyte of on-chip single supply flash memory.

5) Toppan to acquire DuPont Photomasks in $650 million deal …. Diverse Japanese giant Toppan Printing Co. Ltd. has agreed to buy DuPont Photomasks Inc. (Round Rock, Texas) in a deal valued at approximately US$650 million.

Toppan Photomask Inc.? That sounds like a culture clash is in the making. Mixing mask makers and cultures from Japan and Texas will be one tough task even in the best intentions. Will this deal work? I am sure that DNP and Photronics are hoping for some chaos in TPI.ML

Monday, October 4

US moves lift VC Counter in September …. The Silicon Strategies Venture Capital Counter registered $228.4 million of investment in September 2004, the third highest monthly investment total in the year so far.

The VC Counter bounced back from an expectedly quiet August but strangely almost all the activity was in the United States.

Commercially available tools are able to generate cycle-accurate models for real-world designs that run 10 to 100 times faster than traditional event simulators. Assuming performance of 25 kHz, this yields an overall system throughput between 170 kHz and 300 kHz. That's less than the original, 1-Mips number, but it's well within an order of magnitude and certainly fast enough to be usable.

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